HOME > Our Products and Services > Ion implantation services
We can meet widely ranging requirements for ion implantation with various ion implanters and offer analysis services with various analysis devices.
Ion implantation services
| Dopant elements | N, C, F, P, As, B, Ge, Si, Sb, In, O, H, etc. |
|---|---|
| Acceleration energy | 200 eV to 4.6 MeV |
Note: Constraints of size of wafer may be imposed depending on the measureing equipment.
Analysis services
Sheet resistance measurement, crystal fault detection, surface impurities analysis, impurities profile analysis, minor constituent analysis, and film thickness measurement
Note: Constraints may be imposed depending on the type of ion and size of wafer.
| Devices | Type | Manufacturers |
|---|---|---|
| High current ion implanter | LEX3 | SEN Corporation |
| High current ion implanter | LEX | SEN Corporation |
| High current ion implanter | NV-GDSIII-LED | SEN Corporation |
| High current ion implanter | NV-GSD-HC3 | SEN Corporation |
| Medium current ion implanter | MC3 series | SEN Corporation |
| High energy ion implanter | NV-GSD-HE3 | SEN Corporation |
| High energy ion implanter | NV-GSD-HE | SEN Corporation |
| Wafer surface inspection device | LS-6800 | Hitachi High-Technologies Corporation |
| TXRF analyzer | TREX630 | Technos Co., Ltd. |
| ICP-MS | Agilent 7500CS | Yokogawa Analytical Systems, Inc. |
| Wafer review SEM (EDS analysis) | RS-3000 | Hitachi High-Technologies Corporation |
| Scanning electron microscope (EDS analysis) | JSM-5800LV | JEOL Ltd. |
| Sheet resistance measuring equipment | RS-100 | KLA-Tencor Corporation |
| TW measuring equipment | TP630 | KLA-Tencor Corporation |
| Film thickness measuring device - spectroscopic ellipsometer | UT-300 | HORIBA, Ltd. |
| RTP | SUMMIT 300XT | Axcelis Technologies |
| RTP | Reliance850 | Axcelis Technologies |
| Vertical furnace | VF-1000 | Koyo Thermo Systems Co., Ltd. |
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