As a manufacturer specializing in deposition process services for silicon wafers, we provide a variety of process service, particularly forming processes for thin/thick thermal oxidized films. KST World Corp. was established on May 15, 1998 as an affiliate of Kawasaki Sangyo Co., Ltd. (founded in 1950). We were approved as a venture business to receive government support under the Act on Temporary Measures for the Promotion of Creative Business Activities of Small and Medium-sized Enterprises by the Fukui Prefectural government on July 30, 1998. Since January 1999 when a plant equipped with a cutting-edge clean room (class 10) was completed in Fukui City, Fukui Prefecture, we have been delivering products to leading manufacturers around the world as a provider of deposition process service for silicon wafers used for semiconductors, optical parts and MEMS.

In January 2002, we established a mass-production system for silicon wafers with an undercladding layer (an oxide film) for optical parts by using the thermal oxidation method, which had been considered difficult to form thick films. Furthermore, in June 2002, with the support of the Waseda University Incubation Program, our Tokyo Sales Office was opened at the Waseda University Research and Development Center. In June 2004, we were chosen as an approved company under the SME Management Innovation Support Act by the Fukui Prefectural government, and in July, our business was chosen by the Ministry of Economy, Trade and Industry (METI) as a “Consortium R&D Project for Regional Revitalization.” In August, our Tokyo Sales Office was relocated to Nihombashi. Today, our custom-fabrication, high-precision quality, quick response, and competitive prices are highly valued by customers around the globe.